DIAGNOSTICS BY OPTICAL-EMISSION SPECTROSCOPY IN THE VICINITY OF THE SUBSTRATE DURING MAGNETRON SPUTTERING OF TI

被引：10
|
作者：
PECH, T
CHABRERIE, JP
RICARD, A
机构：
[1] UNIV PARIS 11,CNRS,UNITE 73,PHYS GAZ & PLASMAS LAB,F-91405 ORSAY,FRANCE
[2] ECOLE SUPER ELECT,GRECO CONTACTS ELECT 40,F-91190 GIF SUR YVETTE,FRANCE
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 05期
关键词：
D O I：
10.1116/1.575463
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：2987 / 2991
页数：5
相关论文
共 50 条
  • [41] DETERMINATION OF AUTOIONIZATION RATES BY MEANS OF OPTICAL-EMISSION SPECTROSCOPY
    MANNERVIK, S
    CEDERQUIST, H
    KISIELINSKI, M
    PHYSICA SCRIPTA, 1984, T8 : 107 - 111
  • [42] OPTICAL-EMISSION SPECTROSCOPY OF ZINC-SULFIDE ETCH
    ORLOFF, GJ
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1992, 10 (05): : 3065 - 3069
  • [43] DETERMINATION OF CARBON BY DC ARC OPTICAL-EMISSION SPECTROSCOPY
    LOWRY, RK
    STRUBE, LR
    APPLIED SPECTROSCOPY, 1979, 33 (03) : 306 - 307
  • [44] Generation of Charged Ti Nanoparticles and Their Deposition Behavior with a Substrate Bias during RF Magnetron Sputtering
    Kwon, Ji-Hye
    Kim, Du-Yun
    Hwang, Nong-Moon
    COATINGS, 2020, 10 (05)
  • [45] Plasma optical emission spectroscopy as a tool to monitor TiNx deposition via reactive magnetron sputtering
    Sierra-Cruz, I
    Sangines, R.
    Cruz, J.
    Machorro-Mejia, R.
    MATERIALS LETTERS, 2021, 285
  • [46] CHARACTERISTICS OF TiNi THIN FILMS DEPOSITED BY MAGNETRON SPUTTERING SYSTEM WITH OPTICAL EMISSION SPECTROSCOPY MONITOR
    Liu, Erqiang
    Bao, Mingdong
    Yuan, Guozheng
    Xiao, Gesheng
    Jin, Tao
    Li, Zhigang
    Shu, Xuefeng
    SURFACE REVIEW AND LETTERS, 2015, 22 (05)
  • [47] Time-resolved optical emission spectroscopy of pulsed RF plasmas with copper magnetron sputtering
    Kang, Namjun
    Park, Junghoon
    Oh, Soo-ghee
    Kim, Yongmo
    Han, Jeon-geon
    THIN SOLID FILMS, 2008, 516 (11) : 3460 - 3463
  • [48] Optical Emission Spectroscopy Analysis of Ar/N2 Plasma in Reactive Magnetron Sputtering
    Bousquet, Angelique
    Spinelle, Laurent
    Cellier, Joel
    Tomasella, Eric
    PLASMA PROCESSES AND POLYMERS, 2009, 6 : S605 - S609
  • [49] A linear model for the interpretation of optical emission spectroscopy measurements in low pressure DC magnetron sputtering
    Schulte, J
    Sobe, G
    Reiss, G
    CONTRIBUTIONS TO PLASMA PHYSICS, 1997, 37 (06) : 483 - 497
  • [50] Spatial characterization of Ar-Ti plasma in a magnetron sputtering system using emission and absorption spectroscopy
    Britun, N.
    Gaillard, M.
    Schwaederle, L.
    Kim, Y. M.
    Han, J. G.
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2006, 15 (04): : 790 - 796
12345