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- [1] THE GROWTH OF GLOW-DISCHARGE HYDROGENATED AMORPHOUS-SILICONJOURNAL OF NON-CRYSTALLINE SOLIDS, 1987, 97-8 : 1383 - 1386BHAT, PKCHATHAM, HSHING, YHPERRY, JW
- [2] THE NUCLEATION AND GROWTH OF GLOW-DISCHARGE HYDROGENATED AMORPHOUS-SILICONJOURNAL OF APPLIED PHYSICS, 1986, 59 (04) : 1160 - 1166COLLINS, RWPAWLOWSKI, A
- [3] INSITU ELLIPSOMETRY STUDIES OF THE GROWTH OF HYDROGENATED AMORPHOUS-SILICON BY GLOW-DISCHARGEJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03): : 514 - 517COLLINS, RW
- [4] DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON BY AN INDUCTIVELY COUPLED GLOW-DISCHARGE REACTOR WITH SHIELD ELECTRODESJOURNAL OF APPLIED PHYSICS, 1992, 72 (03) : 1188 - 1190YOKOTA, KTAKADA, MOHNO, YKATAYAMA, S
- [5] PLASMA SPECTROSCOPY GLOW-DISCHARGE DEPOSITION OF HYDROGENATED AMORPHOUS-SILICONTHIN SOLID FILMS, 1982, 92 (1-2) : 171 - 187MATSUDA, ATANAKA, K
- [6] MECHANISMS INVOLVED IN THE GLOW-DISCHARGE DEPOSITION OF DOPED HYDROGENATED AMORPHOUS-SILICONJOURNAL OF NON-CRYSTALLINE SOLIDS, 1984, 66 (1-2) : 25 - 29KAMPAS, FJVANIER, PE
- [7] BIAS EFFECTS ON THE DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON FILM IN A GLOW-DISCHARGEAPPLIED PHYSICS LETTERS, 1984, 44 (04) : 413 - 415ANDO, KAOZASA, MPYON, RG
- [8] HYDROGENATED AMORPHOUS-SILICON FILMS PREPARED IN CASCADED GLOW-DISCHARGE REACTORSJOURNAL OF APPLIED PHYSICS, 1986, 59 (05) : 1578 - 1586PANWAR, OSDIXIT, PNBHATTACHARYYA, RSHAH, VV
- [9] HYDROGENATED AMORPHOUS-SILICON FILMS BY 60 HZ GLOW-DISCHARGE DEPOSITIONJOURNAL OF APPLIED PHYSICS, 1993, 74 (01) : 668 - 671FRAGALLI, JFMISOGUTI, LNAKAGAITO, ANGRIVICKAS, VBAGNATO, VSBRANZ, HM