EDGE PROFILES IN THE PLASMA-ETCHING OF POLYCRYSTALLINE SILICON

被引：34
|
作者：
ADAMS, AC
CAPIO, CD
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1981年 / 128卷 / 02期
关键词：
D O I：
10.1149/1.2127423
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：366 / 370
页数：5
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