A NEW FAST-RESPONSE HG VAPOR SOURCE FOR HGCDTE MOLECULAR-BEAM EPITAXY GROWTH

被引:10
|
作者
WAGNER, BK
BENZ, RG
SUMMERS, CJ
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D O I
10.1116/1.576115
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
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页码:295 / 299
页数:5
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