THE EFFECT OF CARBON AND BORON ON THE ACCUMULATION OF VACANCY-OXYGEN COMPLEXES IN SILICON

被引:4
|
作者
AKHMETOV, VD
BOLOTOV, VV
机构
来源
关键词
D O I
10.1080/00337578008210027
中图分类号
TL [原子能技术]; O571 [原子核物理学];
学科分类号
0827 ; 082701 ;
摘要
引用
收藏
页码:149 / 152
页数:4
相关论文
共 50 条
  • [21] The annealing mechanism of the radiation-induced vacancy-oxygen defect in silicon
    Voronkov, V. V.
    Falster, R.
    Londos, C. A.
    JOURNAL OF APPLIED PHYSICS, 2012, 111 (11)
  • [22] Vacancy-oxygen complex in Ge crystals
    Markevich, VP
    Litvinov, VV
    Dobaczewski, L
    Lindström, JL
    Murin, LI
    Vetrov, SV
    Hawkins, ID
    Peaker, AR
    PHYSICA B-CONDENSED MATTER, 2003, 340 : 844 - 848
  • [23] Lattice disorder effects on the vacancy-oxygen centre in ion-irradiated silicon
    Keskitalo, N
    Hallen, A
    Lalita, J
    Svensson, BG
    DEFECTS AND DIFFUSION IN SILICON PROCESSING, 1997, 469 : 233 - 238
  • [24] First principles investigations of hydrogen interaction with vacancy-oxygen complexes in vanadium alloys
    Zhang, Pengbo
    Zou, Tingting
    Feng, Shaobo
    Zhao, Jijun
    INTERNATIONAL JOURNAL OF HYDROGEN ENERGY, 2019, 44 (48) : 26637 - 26645
  • [25] Rapid annealing of the vacancy-oxygen center and the divacancy center by diffusing hydrogen in silicon
    Bleka, J. H.
    Pintilie, I.
    Monakhov, E. V.
    Avset, B. S.
    Svensson, B. G.
    PHYSICAL REVIEW B, 2008, 77 (07)
  • [26] Stability of vacancy-oxygen complexes in bulk nickel: Atomistic and ab initio calculations
    Zenia, H.
    Lounis, K.
    Megchiche, E. H.
    Mijoule, C.
    COMPUTATIONAL MATERIALS SCIENCE, 2016, 124 : 428 - 437
  • [27] Formation rate of vacancy-oxygen complexes in heat-treated Czochralski grown silicon under gamma-irradiation
    Emtsev, V. V.
    Emtsev, V. V., Jr.
    Oganesyan, G. A.
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2007, 18 (07) : 701 - 704
  • [28] Vacancy-oxygen complexes and their optical properties in AlN epitaxial films studied by positron annihilation
    Uedono, A.
    Ishibashi, S.
    Keller, S.
    Moe, C.
    Cantu, P.
    Katona, T. M.
    Kamber, D. S.
    Wu, Y.
    Letts, E.
    Newman, S. A.
    Nakamura, S.
    Speck, J. S.
    Mishra, U. K.
    DenBaars, S. P.
    Onuma, T.
    Chichibu, S. F.
    JOURNAL OF APPLIED PHYSICS, 2009, 105 (05)
  • [29] Vacancy Complexes in Carbon and Boron Nitride Nanotubes
    Mashapa, M. G.
    Chetty, N.
    Ray, S. Sinha
    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2012, 12 (10) : 7796 - 7806
  • [30] A verification of the applicability of the monovalent-defect model to the description of properties of the vacancy-oxygen complex in silicon
    Makarenko, LF
    SEMICONDUCTORS, 2000, 34 (10) : 1112 - 1115