SOME APPLICATIONS OF ION-BEAM SPUTTERING TO HIGH-RESOLUTION ELECTRON-MICROSCOPY

被引：17
|
作者：
HOJOU, K
OIKAWA, T
KANAYA, K
KIMURA, T
ADACHI, K
机构：
[1] KOGAKUIN UNIV, DEPT ELECT ENGN, SHINJUKU KU, TOKYO, JAPAN
[2] SNOW BRAND MILK PROD CO LTD, RES LAB, SAITAMA, JAPAN
[3] UNIV TOKYO, ENGN RES INST, BUNKYO KU, TOKYO 113, JAPAN
来源：
MICRON | 1977年 / 8卷 / 03期
关键词：
D O I：
10.1016/0047-7206(77)90020-6
中图分类号：
TH742 [显微镜];
学科分类号：
摘要：
引用
收藏
页码：151 / 170
页数：20
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