Analytical and High-Resolution Electron Microscopy Studies at Metal/Ceramic Interfaces

被引:0
|
作者
Ruehle, Manfred [1 ]
机构
[1] Max Planck Inst Met Forsch, D-7000 Stuttgart, Germany
关键词
Analytical electron microscopy; high-resolution electron microscopy; interfaces;
D O I
暂无
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
Both analytical electron microscopy and high-resolution electron microscopy are widely used to investigate the structure of and defects in materials. The spatial resolution of the analytical electron microscope (AEM) is < 5 nm and the point-to-point resolution of the high-resolution electron microscope (HREM) is small enough to image lattice planes in metals and ceramics directly. AEM and HREM are described in this paper with special emphasis on the study of interfaces between single crystal Nb-films grown by molecular beam epitaxy (MBE) on (0001) planes of sapphire (Al2O3)-substrates. From these specimens, cross-sectional specimens with thickness < 20 nm were prepared, so that the Nb/Al2O3-interface could be investigated by AEM and HREM. AEM studies revealed that Al2O3 was dissolved by the Nb so that Al could be detected in the Nb adjacent to the interface. The atomistic structure of the interface was identified by HREM. Defects at or close to the interface were analyzed and a model of the atomistic arrangements of the interface in the relaxed, "perfect" regions is described with a discussion of the results.
引用
收藏
页码:75 / 92
页数:18
相关论文
共 50 条
  • [41] HIGH-VOLTAGE AND HIGH-RESOLUTION ELECTRON-MICROSCOPY STUDIES OF INTERFACES IN ZIRCONIA-TOUGHENED ALUMINA
    PIPPEL, E
    WOLTERSDORF, J
    PHILOSOPHICAL MAGAZINE A-PHYSICS OF CONDENSED MATTER STRUCTURE DEFECTS AND MECHANICAL PROPERTIES, 1987, 56 (05): : 595 - 613
  • [42] HIGH-RESOLUTION ELECTRON-MICROSCOPY STUDIES OF NB/AL2O3 INTERFACES
    MAYER, J
    FLYNN, CP
    RUHLE, M
    ULTRAMICROSCOPY, 1990, 33 (01) : 51 - 61
  • [43] HIGH-RESOLUTION ANALYTICAL ELECTRON-MICROSCOPY ON THE HB-501
    WILLIAMS, RG
    BOVEY, PE
    WARDELL, IRM
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1981, 182 (AUG): : 126 - INOR
  • [44] High-resolution analytical electron microscopy of catalytically etched silicon nanowires
    M. Schade
    N. Geyer
    B. Fuhrmann
    F. Heyroth
    H. S. Leipner
    Applied Physics A, 2009, 95 : 325 - 327
  • [45] High-resolution analytical electron microscopy of intergranular stress corrosion cracks
    Thomas, LE
    Charlot, LA
    Bruemmer, SM
    NEW TECHNIQUES FOR CHARACTERIZING CORROSION AND STRESS CORROSION, 1996, : 175 - 191
  • [46] High-resolution analytical transmission electron microscopy of semiconductor quantum structures
    R. Schneider
    H. Kirmse
    I. Hähnert
    W. Neumann
    Fresenius' Journal of Analytical Chemistry, 1999, 365 : 217 - 220
  • [47] High-resolution analytical transmission electron microscopy of semiconductor quantum structures
    Schneider, R
    Kirmse, H
    Hähnert, I
    Neumann, W
    FRESENIUS JOURNAL OF ANALYTICAL CHEMISTRY, 1999, 365 (1-3): : 217 - 220
  • [48] High-resolution analytical electron microscopy of catalytically etched silicon nanowires
    Schade, M.
    Geyer, N.
    Fuhrmann, B.
    Heyroth, F.
    Leipner, H. S.
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2009, 95 (02): : 325 - 327
  • [49] HIGH-RESOLUTION ANALYTICAL ELECTRON MICROSCOPY OF FULLERENES AND NANOTUBES IN BORON NITRIDE
    Golberg, D.
    Bando, Y.
    Han, W.
    Kurashima, K.
    Sato, T.
    Stephan, O.
    Goringe, C.
    ACTA CRYSTALLOGRAPHICA A-FOUNDATION AND ADVANCES, 1999, 55 : 146 - 146
  • [50] HIGH-RESOLUTION ELECTRON-MICROSCOPY OF METAL METAL AND METAL METAL-OXIDE INTERFACES IN THE AG/NI AND AU/NI SYSTEMS
    GAO, Y
    MERKLE, KL
    JOURNAL OF MATERIALS RESEARCH, 1990, 5 (09) : 1995 - 2003