Growth Simulation and Actual MBE Growth of Triangular GaAs Nanowires on Patterned (111) B Substrates

被引:1
|
作者
Tamai, Isao [1 ]
Sato, Taketomo
Hasegawa, Hideki
Hashizume, Tamotsu
机构
[1] Hokkaido Univ, Res Ctr Integrated Quantum Elect RCIQE, North 13,West 8, Sapporo, Hokkaido 0608628, Japan
关键词
Molecular beam epitaxy; Patterned substrate; Quantum wire; Gowth mechanism; allium Arsenide; Aluminum Gallium Arsenide;
D O I
10.1380/ejssnt.2006.19
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Attempts were made to further elaborate our experimental growth method and the theoretical growth simulation method for formation of AlGaAs/GaAs QWRs on the (111) B substrates, paying attention to Al composition dependence of growth. A series of repeated growth experiments were carried out on simple one-sided mesa patterns, and from their analysis of the results led to determination of parameter values needed for computer simulation based on the continuum model. The experimental evolution of the cross-sectional structures was well reproduced by simulation, not only on one-side mesa, but also on mesa stripes actually used for wire growth. Finally, an optimum growth design was derived for growth of an array of GaAs triangular QWRs with 40 nm base width on GaAs (111) B substrate by the simulation, and the actual growth experiment confirmed its realization.
引用
收藏
页码:19 / 24
页数:6
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