CHEMICAL-VAPOR-DEPOSITION OF AROMATIC POLYMERS

被引：0
|
作者：
MOORE, JA [1 ]
LANG, CI [1 ]
LU, TM [1 ]
YANG, GR [1 ]
机构：
[1] RENSSELAER POLYTECH INST,TROY,NY 12180
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1995年 / 209卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
引用
收藏
页码：247 / PMSE
相关论文
共 50 条
  • [31] METALORGANIC CHEMICAL-VAPOR-DEPOSITION CDTE PASSIVATION OF HGCDTE
    NEMIROVSKY, Y
    AMIR, N
    DJALOSHINSKI, L
    JOURNAL OF ELECTRONIC MATERIALS, 1995, 24 (05) : 647 - 654
  • [32] CHEMICAL-VAPOR-DEPOSITION OF PYROLYTIC CARBON ON POLISHED SUBSTRATES
    DESPRES, JF
    VAHLAS, C
    OBERLIN, A
    JOURNAL DE PHYSIQUE IV, 1993, 3 (C3): : 563 - 570
  • [33] PHOTOCONDUCTIVE SPECTROSCOPY OF DIAMOND GROWN BY CHEMICAL-VAPOR-DEPOSITION
    ALLERS, L
    COLLINS, AT
    JOURNAL OF APPLIED PHYSICS, 1995, 77 (08) : 3879 - 3884
  • [34] LASER-ASSISTED CHEMICAL-VAPOR-DEPOSITION OF GRAPHITE
    TYNDALL, GW
    HACKER, NP
    CHEMISTRY OF MATERIALS, 1994, 6 (11) : 1982 - 1985
  • [35] THE ROLE OF THE SUBSTRATE IN PHOTOENHANCED METALORGANIC CHEMICAL-VAPOR-DEPOSITION
    MAAYAN, E
    KREININ, O
    VEINGER, D
    THON, A
    BAHIR, G
    SALZMAN, J
    APPLIED PHYSICS LETTERS, 1995, 66 (03) : 296 - 298
  • [36] METALORGANIC CHEMICAL-VAPOR-DEPOSITION OF HGCDTE FOR PHOTODIODE APPLICATIONS
    MITRA, P
    SCHIMERT, TR
    CASE, FC
    STARR, R
    WEILER, MH
    KESTIGIAN, M
    REINE, MB
    JOURNAL OF ELECTRONIC MATERIALS, 1995, 24 (05) : 661 - 668
  • [37] NUCLEATION MECHANISMS OF DIAMOND IN PLASMA CHEMICAL-VAPOR-DEPOSITION
    YUGO, S
    KIMURA, T
    KANAI, T
    DIAMOND AND RELATED MATERIALS, 1993, 2 (2-4) : 328 - 332
  • [38] CHLORINE-ACTIVATED DIAMOND CHEMICAL-VAPOR-DEPOSITION
    PAN, CY
    CHU, CJ
    MARGRAVE, JL
    HAUGE, RH
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1994, 141 (11) : 3246 - 3249
  • [39] Computer modeling of low pressure chemical-vapor-deposition
    Xu, Da-Wei
    Li, Wei-Hua
    Zhou, Zai-Fa
    Dianzi Qijian/Journal of Electron Devices, 2006, 29 (01): : 241 - 243
  • [40] A KINETICS AND TRANSPORT MODEL OF DICHLOROSILANE CHEMICAL-VAPOR-DEPOSITION
    KNUTSON, KL
    CARR, RW
    LIU, WH
    CAMPBELL, SA
    JOURNAL OF CRYSTAL GROWTH, 1994, 140 (1-2) : 191 - 204
12345