CHEMICAL-VAPOR-DEPOSITION OF AROMATIC POLYMERS

被引：0

作者：

MOORE, JA ^{[1
]}

LANG, CI ^{[1
]}

LU, TM ^{[1
]}

YANG, GR ^{[1
]}

机构：

[1] RENSSELAER POLYTECH INST,TROY,NY 12180

来源：

ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1995年 / 209卷

关键词：

D O I：

暂无

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：247 / PMSE

共 50 条

[21] LASER CHEMICAL-VAPOR-DEPOSITION OF TITANIUM NITRIDE
CHEN, XL
MAZUMDER, J
PHYSICAL REVIEW B, 1995, 52 (08): : 5947 - 5952
[22] CHEMICAL-VAPOR-DEPOSITION OF ALUMINUM FOR ULSI APPLICATIONS
RHEE, SW
KOREAN JOURNAL OF CHEMICAL ENGINEERING, 1995, 12 (01) : 1 - 11
[23] INCORPORATION OF NITROGEN IN CHEMICAL-VAPOR-DEPOSITION DIAMOND
SAMLENSKI, R
HAUG, C
BRENN, R
WILD, C
LOCHER, R
KOIDL, P
APPLIED PHYSICS LETTERS, 1995, 67 (19) : 2798 - 2800
[24] MECHANISTIC STUDIES OF THE CHEMICAL-VAPOR-DEPOSITION OF GOLD
PAUL, A
BENT, BE
SEIDLER, PF
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1994, 207 : 57 - COLL
[25] DRIVING-FORCE FOR DEPOSITION IN THE CHEMICAL-VAPOR-DEPOSITION PROCESS
HWANG, NM
YOON, DY
JOURNAL OF MATERIALS SCIENCE LETTERS, 1994, 13 (19) : 1437 - 1439
[26] ORGANOMETALLIC CHEMICAL-VAPOR-DEPOSITION OF COMPOUND SEMICONDUCTORS - A CHEMICAL PERSPECTIVE
JENSEN, KF
MATERIALS CHEMISTRY: AN EMERGING DISCIPLINE, 1995, 245 : 397 - 423
[27] CHEMICAL ADDITIVES FOR IMPROVED COPPER CHEMICAL-VAPOR-DEPOSITION PROCESSING
NORMAN, JAT
ROBERTS, DA
HOCHBERG, AK
SMITH, P
PETERSEN, GA
PARMETER, JE
APBLETT, CA
OMSTEAD, TR
THIN SOLID FILMS, 1995, 262 (1-2) : 46 - 51
[28] CHEMICAL-VAPOR-DEPOSITION FOR OPTICAL-FIBER TECHNOLOGY
COGNOLATO, L
JOURNAL DE PHYSIQUE IV, 1995, 5 (C5): : 975 - 987
[29] CHEMICAL-VAPOR-DEPOSITION OF NITRIDE THIN-FILMS
HOFFMAN, DM
POLYHEDRON, 1994, 13 (08) : 1169 - 1179
[30] CHEMICAL-VAPOR-DEPOSITION OF HAFNIUM CARBIDE AND HAFNIUM NITRIDE
EMIG, G
SCHOCH, G
WORMER, O
JOURNAL DE PHYSIQUE IV, 1993, 3 (C3): : 535 - 540

← 1 2 3 4 5 →