CO2-LASER ANNEALING OF NITROGEN-IMPLANTED GAAS0.6P0.4

被引：0
|
作者：
TAKAI, M [1 ]
RYSSEL, H [1 ]
机构：
[1] FRAUNHOFER INST FESTKORPER TECHNOL,MUNCHEN,FED REP GER
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1979年 / 126卷 / 08期
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D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
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页码：C362 / C362
页数：1
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