CO2-LASER ANNEALING OF NITROGEN-IMPLANTED GAAS0.6P0.4

被引：0

作者：

TAKAI, M ^{[1
]}

RYSSEL, H ^{[1
]}

机构：

[1] FRAUNHOFER INST FESTKORPER TECHNOL,MUNCHEN,FED REP GER

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1979年 / 126卷 / 08期

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：C362 / C362

页数：1

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