INTERSTITIAL AND SUBSTITUTIONAL COMPONENTS IN ION-IMPLANTED SILICON

被引：0
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作者：
MAYER, JW
DAVIES, JA
ERIKSSON, L
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来源：
BULLETIN OF THE AMERICAN PHYSICAL SOCIETY | 1968年 / 13卷 / 03期
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中图分类号：
O4 [物理学];
学科分类号：
0702 ;
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页码：376 / &
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