INFRARED STUDY OF STRUCTURAL-CHANGES IN SILICON OXYNITRIDE FILMS

被引：0

作者：

PIVAC, B

机构：

[1] Rudger Boskovic Inst, Zagreb, Croatia

来源：

JOURNAL OF MATERIALS SCIENCE LETTERS | 1993年 / 12卷 / 01期

关键词：

D O I：

暂无

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Many properties of silicon oxynitride may be strongly influenced by chemical composition, preparation and further treatment. Therefore, a fundamental knowledge of these relationships and connections with material structures is necessary for successful film deposition. In order to understand and/or to predict the behaviour of such films, we studied the influence of thermal treatment on the structural properties of various silicon oxynitride films obtained by the PECVD technique.

引用

页码：23 / 26

页数：4

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