DEEP LEVEL TRANSIENT SPECTROSCOPY STUDY OF STAEBLER-WRONSKI EFFECT IN A-SI-H

被引:2
|
作者
MIYANISHI, A [1 ]
NAKATA, J [1 ]
IMAO, S [1 ]
SHIRAFUJI, J [1 ]
KUBO, U [1 ]
INUISHI, Y [1 ]
机构
[1] OSAKA UNIV,DEPT ELECT ENGN,SUITA,OSAKA 565,JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1991年 / 30卷 / 2B期
关键词
A-SI-H; OPTICAL DEGRADATION; STAEBLER-WRONSKI EFFECT; DLTS; WEAK BOND; HOLE TRAP;
D O I
10.1143/JJAP.30.L243
中图分类号
O59 [应用物理学];
学科分类号
摘要
Both voltage- and photoinjected DLTS study of the Staebler-Wronski effect in a-Si:H using isothermal high-speed capacitance-time (C-t) measurements (10(-3) approximately 10 s) were done to elucidate the processes of defect creation and annealing. It was found that the densities of hole traps at E(v) + 0.6 eV and electron traps at E(c) -0.4 eV were decreased by light soaking, accompanied by a simultaneous increase of electron traps at E(c) -0.9 eV and hole traps at E(v) + 0.8 eV due to the dangling bonds. This fact suggests that the shallower traps may relate to the weak bonds, which convert to the metastable dangling bonds by light soaking.
引用
收藏
页码:L243 / L245
页数:3
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