INFLUENCE OF RADIATION DEFECTS ON THE KINETICS OF FORMATION OF THERMAL DONORS IN SILICON

被引:0
|
作者
LITVINOV, VV
PALCHIK, GV
URENEV, VI
机构
来源
SOVIET PHYSICS SEMICONDUCTORS-USSR | 1990年 / 24卷 / 02期
关键词
D O I
暂无
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
引用
收藏
页码:233 / 235
页数:3
相关论文
共 50 条
  • [21] INFLUENCE OF NICKEL ON THE KINETICS OF FORMATION AND ANNEALING OF THERMAL CENTERS IN SILICON
    ABDURAKHMANOV, KP
    KHODZHAEV, MD
    TESHABAEV, AT
    UMAROV, TA
    SOVIET PHYSICS SEMICONDUCTORS-USSR, 1989, 23 (07): : 810 - 811
  • [22] Aggregation kinetics of thermal double donors in silicon
    Lee, YJ
    von Boehm, J
    Pesola, M
    Nieminen, RM
    PHYSICAL REVIEW LETTERS, 2001, 86 (14) : 3060 - 3063
  • [23] Influence of the thermal history of melts on the formation of grown-in defects in silicon
    Ikari, A
    Izunome, K
    Kawanishi, S
    Togawa, S
    Terashima, K
    Kimura, S
    JOURNAL OF CRYSTAL GROWTH, 1996, 167 (1-2) : 361 - 364
  • [24] OXYGEN IN SILICON - THERMAL DONORS, INTRINSIC DEFECTS AND CONTAMINATION
    NEWMAN, RC
    VACUUM, 1991, 42 (5-6) : 379 - 382
  • [25] THERMAL DONORS AND CARBON-OXYGEN DEFECTS IN SILICON
    LINDSTROM, JL
    WEMAN, H
    OEHRLEIN, GS
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1987, 99 (02): : 581 - 591
  • [26] Oxygen precipitates and the formation of thermal donors in silicon
    Vabishchevich, NV
    Brinkevich, DI
    Prosolovich, VS
    SEMICONDUCTORS, 1998, 32 (06) : 640 - 641
  • [27] Oxygen precipitates and the formation of thermal donors in silicon
    N. V. Vabishchevich
    D. I. Brinkevich
    V. S. Prosolovich
    Semiconductors, 1998, 32 : 640 - 641
  • [28] Formation kinetics of the Al-related shallow thermal donors: A probe for oxygen diffusion in silicon
    Kaczor, P
    Dobaczewski, L
    Gregorkiewicz, T
    Ammerlaan, CAJ
    DEFECTS IN SEMICONDUCTORS - ICDS-19, PTS 1-3, 1997, 258-2 : 1761 - 1766
  • [29] THE KINETICS OF THERMAL DONOR FORMATION IN SILICON
    NEWMAN, RC
    CLAYBOURN, M
    SHALLOW IMPURITIES IN SEMICONDUCTORS 1988, 1989, 95 : 211 - 220
  • [30] THE KINETICS OF THERMAL DONOR FORMATION IN SILICON
    NEWMAN, RC
    CLAYBOURN, M
    INSTITUTE OF PHYSICS CONFERENCE SERIES, 1989, (95): : 211 - 220