THINNING OF A SILICON-SILICON OXIDE WAFER FOR TRANSMISSION ELECTRON-MICROSCOPY

被引：1

作者：

BAYLES, RA ^{[1
]}

JESSER, WA ^{[1
]}

机构：

[1] UNIV VIRGINIA,SCH ENGN & APPL SCI,DEPT MAT SCI,CHARLOTTESVILLE,VA 22901

来源：

MICRON | 1977年 / 8卷 / 1-2期

关键词：

D O I：

10.1016/0047-7206(77)90007-3

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

引用

页码：37 / 40

页数：4

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