COPPER PRECIPITATION ON DISLOCATIONS IN SILICON

被引：430

|

作者：

DASH, WC

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1956年 / 27卷 / 10期

关键词：

D O I：

10.1063/1.1722229

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：1193 / 1195

页数：3

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