COPPER PRECIPITATION ON DISLOCATIONS IN SILICON

被引：430
|
作者：
DASH, WC
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1956年 / 27卷 / 10期
关键词：
D O I：
10.1063/1.1722229
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：1193 / 1195
页数：3
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