ATOMIC INTER-DIFFUSION AND ELECTRONIC-STRUCTURE AT COMPOUND SEMICONDUCTOR INTERFACES

被引：0
|
作者：
BRILLSON, L [1 ]
机构：
[1] XEROX CORP,WEBSTER RES CTR,WEBSTER,NY 14580
来源：
BULLETIN OF THE AMERICAN PHYSICAL SOCIETY | 1981年 / 26卷 / 03期
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D O I：
暂无
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
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页码：233 / 233
页数：1
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