ATOMIC INTER-DIFFUSION AND ELECTRONIC-STRUCTURE AT COMPOUND SEMICONDUCTOR INTERFACES

被引：0

|

作者：

BRILLSON, L ^{[1
]}

机构：

[1] XEROX CORP,WEBSTER RES CTR,WEBSTER,NY 14580

来源：

BULLETIN OF THE AMERICAN PHYSICAL SOCIETY | 1981年 / 26卷 / 03期

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中图分类号：

O4 [物理学];

学科分类号：

0702 ;

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页码：233 / 233

页数：1

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