DETERMINATION OF TRACE-METALS IN POSITIVE PHOTORESISTS

被引：4

作者：

FITZGERALD, EA

ALMEIDA, RF

机构：

[1] OCG Microelectronic Materials, Rhode Island 02914, East Providence

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1992年 / 139卷 / 05期

关键词：

Metals and Alloys - Trace Analysis - Sodium and Alloys - Absorption;

D O I：

10.1149/1.2069421

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Several trace elements have been determined in photoresist by graphite furnace atomic absorption and ICP-atomic emission analysis of directly diluted resists. Detection limits and recovery levels were determined. Results were compared to ICP-mass spectrometry.

引用

页码：1413 / 1414

页数：2

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