DETERMINATION OF TRACE-METALS IN POSITIVE PHOTORESISTS

被引：4
|
作者：
FITZGERALD, EA
ALMEIDA, RF
机构：
[1] OCG Microelectronic Materials, Rhode Island 02914, East Providence
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1992年 / 139卷 / 05期
关键词：
Metals and Alloys - Trace Analysis - Sodium and Alloys - Absorption;
D O I：
10.1149/1.2069421
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
Several trace elements have been determined in photoresist by graphite furnace atomic absorption and ICP-atomic emission analysis of directly diluted resists. Detection limits and recovery levels were determined. Results were compared to ICP-mass spectrometry.
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页码：1413 / 1414
页数：2
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