HIGH-RESOLUTION ION-BEAM LITHOGRAPHY

被引：19
|
作者：
ECONOMOU, NP
FLANDERS, DC
DONNELLY, JP
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 19卷 / 04期
关键词：
D O I：
10.1116/1.571237
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1172 / 1175
页数：4
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