HIGH-RESOLUTION ION-BEAM LITHOGRAPHY

被引：19
|
作者：
ECONOMOU, NP
FLANDERS, DC
DONNELLY, JP
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 19卷 / 04期
关键词：
D O I：
10.1116/1.571237
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1172 / 1175
页数：4
相关论文
共 50 条
  • [21] PROJECTION ION-BEAM LITHOGRAPHY
    LOSCHNER, H
    STENGL, G
    CHALUPKA, A
    FEGERL, J
    FISCHER, R
    HAMMEL, E
    LAMMER, G
    MALEK, L
    NOWAK, R
    TRAHER, C
    VONACH, H
    WOLF, P
    HILL, RW
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06): : 2409 - 2415
  • [22] FOCUSED ION-BEAM LITHOGRAPHY
    GAMO, K
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1992, 65 (1-4): : 40 - 49
  • [23] FOCUSED ION-BEAM LITHOGRAPHY
    MELNGAILIS, J
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1993, 80-1 : 1271 - 1280
  • [24] FOCUSED ION-BEAM LITHOGRAPHY
    HUH, JS
    SHEPARD, MI
    MELNGAILIS, J
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (01): : 173 - 175
  • [25] ION BEAM LITHOGRAPHY: AN INVESTIGATION OF RESOLUTION LIMITS AND SENSITIVITIES OF ION-BEAM EXPOSED PMMA.
    Karapiperis, L.
    Dubreuil, D.
    David, Ph.
    Dieumegard, D.
    1600, (03):
  • [26] IMPROVEMENTS IN TARGETRY AND HIGH-VOLTAGE STABILITY FOR HIGH-RESOLUTION ION-BEAM EXPERIMENTS
    WUSTENBECKER, S
    EBBING, H
    SCHULTE, WH
    BAUMEISTER, H
    BECKER, HW
    CLEFF, B
    ROLFS, C
    TRAUTVETTER, HP
    MITCHELL, GE
    SCHWEITZER, JS
    PETERSON, CA
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 1989, 279 (03): : 448 - 466
  • [27] APPLICATION OF THE ION-BEAM SPUTTER DEPOSITION METHOD TO THE COATING FOR HIGH-RESOLUTION SEM
    KATOH, M
    ADACHI, M
    ADACHI, K
    OHO, E
    BABA, N
    KANAYA, K
    JOURNAL OF ELECTRON MICROSCOPY, 1989, 38 (04): : 317 - 317
  • [28] HIGH-RESOLUTION VUV SPECTROSCOPY OF ARGON RECOIL IONS INDUCED BY AN ION-BEAM
    LESTEVENVAISSE, I
    FOLKMANN, F
    BENSITEL, A
    CHANTEPIE, M
    LECLER, D
    PHYSICA SCRIPTA, 1988, 38 (01): : 45 - 54
  • [29] SOME APPLICATIONS OF ION-BEAM SPUTTERING TO HIGH-RESOLUTION ELECTRON-MICROSCOPY
    HOJOU, K
    OIKAWA, T
    KANAYA, K
    KIMURA, T
    ADACHI, K
    MICRON, 1977, 8 (03) : 151 - 170
  • [30] ION-BEAM LITHOGRAPHY AT NANOMETER DIMENSIONS
    ADESIDA, I
    KRATSCHMER, E
    WOLF, ED
    MURAY, A
    ISAACSON, M
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01): : 45 - 49
12345