SOLUTION-PHASE REACTIVITY AS A GUIDE TO THE LOW-TEMPERATURE CHEMICAL VAPOR-DEPOSITION OF EARLY-TRANSITION-METAL NITRIDE THIN-FILMS

被引：90
|
作者：
FIX, RM [1 ]
GORDON, RG [1 ]
HOFFMAN, DM [1 ]
机构：
[1] HARVARD UNIV,DEPT CHEM,12 OXFORD ST,CAMBRIDGE,MA 02138
来源：
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 1990年 / 112卷 / 21期
关键词：
D O I：
10.1021/ja00177a075
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
[No abstract available]
引用
收藏
页码：7833 / 7835
页数：3
相关论文
共 50 条
  • [31] METASTABLE PHASE FORMATION IN THIN-FILMS FORMED BY LASER BREAKDOWN CHEMICAL VAPOR-DEPOSITION
    MENON, SK
    JERVIS, TR
    SCRIPTA METALLURGICA, 1986, 20 (11): : 1519 - 1522
  • [32] CHEMICAL VAPOR-DEPOSITION OF CUBIC GALLIUM SULFIDE THIN-FILMS - A NEW METASTABLE PHASE
    MACINNES, AN
    POWER, MB
    BARRON, AR
    CHEMISTRY OF MATERIALS, 1992, 4 (01) : 11 - 14
  • [33] DEPOSITION OF SILICON-OXIDE, NITRIDE AND OXYNITRIDE THIN-FILMS BY REMOTE PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION
    LUCOVSKY, G
    TSU, DV
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1987, 90 (1-3) : 259 - 266
  • [34] LOW-TEMPERATURE METALORGANIC CHEMICAL VAPOR-DEPOSITION OF PEROVSKITE PB(ZRXTI1-X)O3 THIN-FILMS
    PENG, CH
    DESU, SB
    APPLIED PHYSICS LETTERS, 1992, 61 (01) : 16 - 18
  • [35] Low temperature chemical vapor deposition of superconducting vanadium nitride thin films
    Mohimi, Elham
    Zhang, Zhejun V.
    Mallek, Justin L.
    Liu, Sumeng
    Trinh, Brian B.
    Shetty, Pralav P.
    Girolami, Gregory S.
    Abelson, John R.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2019, 37 (03):
  • [36] CHEMICAL VAPOR-DEPOSITION OF IRON-COBALT THIN-FILMS FROM ORGANO-TRANSITION METAL-COMPLEXES
    CZEKAJKORN, CL
    GEOFFROY, GL
    MESSIER, R
    SPEAR, K
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1985, 190 (SEP): : 231 - INR
  • [37] THIN-FILMS OF BINARY METAL-OXIDES BY CHEMICAL VAPOR-DEPOSITION FROM ORGANOMETALLIC CHELATES
    BENDOR, L
    DRUILHE, R
    GIBART, P
    JOURNAL OF CRYSTAL GROWTH, 1974, 24 (OCT) : 172 - 174
  • [38] SYNCHROTRON RADIATION-INDUCED CHEMICAL VAPOR-DEPOSITION OF THIN-FILMS FROM METAL HEXACARBONYLS
    MANCINI, DC
    VARMA, S
    SIMONS, JK
    ROSENBERG, RA
    DOWBEN, PA
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1990, 8 (06): : 1804 - 1807
  • [39] LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF LOW INSITU PHOSPHORUS DOPED SILICON THIN-FILMS
    SARRET, M
    LIBA, A
    BONNAUD, O
    APPLIED PHYSICS LETTERS, 1991, 59 (12) : 1438 - 1439
  • [40] FORMATION CONDITIONS AND STRUCTURE OF THIN CHROMIUM FILMS PREPARED BY LOW-TEMPERATURE VAPOR-DEPOSITION
    IMURA, T
    THIN SOLID FILMS, 1982, 94 (03) : 249 - 255
12345