SOLUTION-PHASE REACTIVITY AS A GUIDE TO THE LOW-TEMPERATURE CHEMICAL VAPOR-DEPOSITION OF EARLY-TRANSITION-METAL NITRIDE THIN-FILMS

被引：90
|
作者：
FIX, RM [1 ]
GORDON, RG [1 ]
HOFFMAN, DM [1 ]
机构：
[1] HARVARD UNIV,DEPT CHEM,12 OXFORD ST,CAMBRIDGE,MA 02138
来源：
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 1990年 / 112卷 / 21期
关键词：
D O I：
10.1021/ja00177a075
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
[No abstract available]
引用
收藏
页码：7833 / 7835
页数：3
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