THE PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION OF TIC, TIN AND TICXN1-X

被引：98

|

作者：

ARCHER, NJ ^{[1
]}

机构：

[1] FULMER RES INST,STOKE POGES SL2 4QD,BUCKINGHAMSHIRE,ENGLAND

来源：

THIN SOLID FILMS | 1981年 / 80卷 / 1-3期

关键词：

D O I：

10.1016/0040-6090(81)90225-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：221 / 225

页数：5

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