STRUCTURE CHANGES IN PBTIO3 FILMS INDUCED BY ION-IMPLANTATION WITH AR+ AND N+

被引:2
|
作者
QU, BD
WANG, YG
WANG, ZL
ZHONG, WL
WANG, KM
机构
[1] Department of Physics, Shandong University, Jinan
关键词
D O I
10.1016/0375-9601(92)90282-Q
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Structure changes of PbTiO3 films induced by ion implantation with Ar+ and N+ were measured by X-ray diffraction and MeV He-4+ Rutherford backscattering. The lead segregation which occurred in the volume of the collision cascade and the amorphization of the surface layer of the films are discussed.
引用
收藏
页码:411 / 414
页数:4
相关论文
共 50 条
  • [31] Processing of PbTiO3 thin films .3. Effects of ion bombardment
    Li, CC
    Desu, SB
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1996, 14 (01): : 13 - 21
  • [32] ION-BEAM-ASSISTED DEPOSITION OF FERROELECTRIC PBTIO3 FILMS
    QU, BD
    ZHONG, WL
    WANG, KM
    ZHANG, PL
    WANG, ZL
    LI, WZ
    JOURNAL OF APPLIED PHYSICS, 1993, 74 (04) : 2896 - 2899
  • [33] THE N-TYPE DOPING OF POLYANILINE FILMS BY ION-IMPLANTATION
    WANG, WM
    LIN, SH
    BAO, JG
    RONG, TW
    WAN, HG
    SUN, JH
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1993, 74 (04): : 514 - 518
  • [34] AR ION-IMPLANTATION INDUCED ELECTRICAL AND STRUCTURAL-CHANGES IN EPITAXIAL YBA2CU3O7-X THIN-FILMS
    LI, YJ
    XIONG, GC
    GAN, ZZ
    PHYSICA C, 1992, 199 (3-4): : 269 - 275
  • [35] Preparation of PbTiO3 thin films by ion-beam sputtering
    Hashima, H
    Nakajima, S
    Suzuki, Y
    Ogawa, S
    THIN SOLID FILMS, 1996, 281 : 463 - 465
  • [36] SPUTTERING EFFECTS AT ION-IMPLANTATION ENERGIES - 20-KEV AR+ IONS INTO (111) AND (111) GAAS
    COMAS, J
    LUCKE, WH
    REPORT OF NRL PROGRESS, 1973, (APR): : 42 - 44
  • [37] CHANGES IN PHASE STRUCTURE AND FORMATION OF CHEMICAL COMPOUNDS BY ION-IMPLANTATION OF TANTALUM THIN-FILMS
    WILSON, IH
    GOH, KH
    STEPHENS, KG
    THIN SOLID FILMS, 1976, 36 (02) : 414 - 414
  • [38] EFFECT OF N+ ION-IMPLANTATION ON THE OXIDATION OF SILICON AND METAL-OXIDE-SEMICONDUCTOR CHARACTERISTICS
    KUDO, K
    KUNIYOSHI, S
    TANAKA, K
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1989, 4 (1-4): : 383 - 386
  • [39] ION-IMPLANTATION INDUCED CHANGE IN FIBRILLAR MORPHOLOGY OF POLYACETYLENE FILMS
    KOSHIDA, N
    HIRAYAMA, N
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1991, 59 : 1292 - 1294
  • [40] CHANGES IN PHASE STRUCTURE AND FORMATION OF CHEMICAL COMPOUNDS BY ION-IMPLANTATION OF TANTALUM THIN-FILMS
    WILSON, IH
    GOH, KH
    STEPHENS, KG
    THIN SOLID FILMS, 1976, 33 (02) : 205 - 218