CHARACTERIZATION OF DIFFUSION INDUCED GRAIN-BOUNDARY MIGRATION IN THE AG CU SYSTEM

被引：15
|
作者：
GUAN, ZM
LIU, GX
DU, J
机构：
[1] Department of Materials Science and Engineering, University of Science and Technology Beijing
来源：
ACTA METALLURGICA ET MATERIALIA | 1993年 / 41卷 / 04期
关键词：
D O I：
10.1016/0956-7151(93)90180-Z
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The phenomenon of diffusion induced grain boundary migration (DIGM) when silver diffuses along copper's grain boundaries was confirmed through the characterization of the microstructure and the morphology of the migrated boundaries, the discontinuity and asymmetric character of the concentration profile, the dislocation configuration and the kinetics of migration by means of SEM, EPMA, TEM and AEM. The experimental results were discussed to prove the existence and the characteristics of DIGM in Ag/Cu system.
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页码：1293 / 1300
页数：8
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