THE EFFECTS OF CO, H, NH3, CH3OH, H2O, AND C2H4 ON THE ELECTRONIC-PROPERTIES OF ULTRATHIN CU FILMS SUPPORTED OVER RU(0001) - AN XPS STUDY

被引：27
|
作者：
RODRIGUEZ, JA
CAMPBELL, RA
CORNEILLE, JS
GOODMAN, DW
机构：
[1] Chemistry Department, Texas A and M University, College Station
来源：
CHEMICAL PHYSICS LETTERS | 1991年 / 180卷 / 1-2期
关键词：
D O I：
10.1016/0009-2614(91)87130-4
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
The interaction of CO, H, NH3, CH3OH, H2O, and C2H4 with ultrathin Cu films supported on Ru(0001) has been studied by means of XPS and TPD. For films with theta-Cu less-than-or-equal-to 1, adsorption of CO, C2H4, and H induced shifts of +0.5, +0.3, and +0.25 eV, respectively, in the Cu(2p3/2) peak position. Negligible shifts were observed upon adsorption of NH3, CH3OH, and H2O. The XPS results are consistent with a model in which the electron density transferred from a Cu monolayer to the adsorbates follows the trend: CO > C2H4, H > NH3, CH3OH, H2O.
引用
收藏
页码：139 / 144
页数：6
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