DIFFUSION INDUCED RECRYSTALLIZATION DURING ION-BEAM MILLING

被引:3
|
作者
GIANNUZZI, LA
HOWELL, PR
PICKERING, HW
BITLER, WR
机构
[1] Department of Materials Science, Engineering The Pennsylvania State University University Park
来源
SCRIPTA METALLURGICA ET MATERIALIA | 1990年 / 24卷 / 12期
关键词
D O I
10.1016/0956-716X(90)90102-M
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
[No abstract available]
引用
收藏
页码:2407 / 2412
页数:6
相关论文
共 50 条
  • [41] Field-ion specimen preparation using focused ion-beam milling
    Larson, DJ
    Foord, DT
    Petford-Long, AK
    Liew, H
    Blamire, MG
    Cerezo, A
    Smith, GDW
    ULTRAMICROSCOPY, 1999, 79 (1-4) : 287 - 293
  • [42] AMORPHIZATION AND RECRYSTALLIZATION OF 6H-SIC BY ION-BEAM IRRADIATION
    HEERA, V
    STOEMENOS, J
    KOGLER, R
    SKORUPA, W
    JOURNAL OF APPLIED PHYSICS, 1995, 77 (07) : 2999 - 3009
  • [43] Amorphization and recrystallization of 6H-SiC by ion-beam irradiation
    Heera, V.
    Stoemenos, J.
    Kogler, R.
    Skorupa, W.
    Journal of Applied Physics, 1995, 77 (07):
  • [44] APPLICATION OF ION-BEAM METHODS TO DIFFUSION AND PERMEATION MEASUREMENTS
    MOLLER, W
    SCHERZER, BMU
    BEHRISCH, R
    NUCLEAR INSTRUMENTS & METHODS, 1980, 168 (1-3): : 289 - 294
  • [45] ION-BEAM INVESTIGATION OF SB DIFFUSION AND SOLUBILITY IN FE
    MYERS, SM
    RACK, HJ
    JOURNAL OF APPLIED PHYSICS, 1978, 49 (06) : 3246 - 3254
  • [46] An ion-beam technique for measuring surface diffusion coefficients
    DeLuca, PM
    Labanda, JGC
    Barnett, SA
    APPLIED PHYSICS LETTERS, 1999, 74 (12) : 1719 - 1721
  • [47] ION-BEAM DEPOSITION AND INSITU ION-BEAM ANALYSIS
    ALBAYATI, AH
    ORRMANROSSITER, KG
    ARMOUR, DG
    VANDENBERG, JA
    DONNELLY, SE
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1992, 63 (1-2): : 109 - 119
  • [48] A CRITICAL DISCUSSION OF THE VACANCY DIFFUSION-MODEL OF ION-BEAM INDUCED EPITAXIAL CRYSTALLIZATION
    HEERA, V
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1989, 114 (02): : 599 - 607
  • [49] Symmetry of surface nanopatterns induced by ion-beam sputtering: Role of anisotropic surface diffusion
    Renedo, Javier
    Cuerno, Rodolfo
    Castro, Mario
    Munoz-Garcia, Javier
    PHYSICAL REVIEW B, 2016, 93 (15)
  • [50] IMPLANTATION AND DIFFUSION OF NOBLE-GAS ATOMS DURING ION-BEAM ETCHING OF SILICON
    SAWYER, WD
    WEBER, J
    NABERT, G
    SCHMALZLIN, J
    HABERMEIER, HU
    JOURNAL OF APPLIED PHYSICS, 1990, 68 (12) : 6179 - 6186