ELECTROMIGRATION EARLY-FAILURE DISTRIBUTION

被引：12
|
作者：
HOANG, HH
NIKKEL, EL
MCDAVID, JM
MACNAUGHTON, RB
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1989年 / 65卷 / 03期
关键词：
D O I：
10.1063/1.343038
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1044 / 1047
页数：4
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