OPTICAL-PROPERTIES OF REACTIVE ION ETCHED CORNER REFLECTOR STRAINED-LAYER INGAAS-GAAS-ALGAAS QUANTUM-WELL LASERS

被引:12
|
作者
SMITH, GM
FORBES, DV
COLEMAN, JJ
VERDEYEN, JT
机构
[1] Microelectronics Laboratory, University of Illinois, Urbana, IL
基金
美国国家科学基金会;
关键词
D O I
10.1109/68.238239
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The dry etched corner reflector (CR) may be a suitable candidate for a high-reflectivity integrable laser cavity structure. We describe here the optical properties of strained-layer InGaAs-GaAs-AlGaAs quantum-well lasers with a cavity comprised of a single cleaved facet and an etched CR. For comparison, we contrast these data with Fabry-Perot lasers made from the same material having either two cleaved facets or one cleaved and one straight-etched facet. The etched CR exhibits higher overall reflectivity than the straight-etched and cleaved facet structures, resulting in lower threshold current density and higher efficiency. However, near-field measurements indicate that improvement in reflectivity from the etched CR's is offset by their tendency to favor odd-order transverse modes.
引用
收藏
页码:873 / 876
页数:4
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