OXIDATION OF KR-85-LABELLED COPPER-FILMS

被引：1

作者：

BAIRD, T ^{[1
]}

BODYS, JWS ^{[1
]}

CAMPBELL, KC ^{[1
]}

机构：

[1] UNIV GLASGOW,CHEM DEPT,GLASGOW G12 8QQ,SCOTLAND

来源：

INTERNATIONAL JOURNAL OF APPLIED RADIATION AND ISOTOPES | 1974年 / 25卷 / 06期

关键词：

D O I：

10.1016/0020-708X(74)90094-5

中图分类号：

TL [原子能技术]; O571 [原子核物理学];

学科分类号：

0827 ; 082701 ;

摘要：

引用

页码：269 / &

共 50 条

[31] REACTIVE ION ETCHING OF COPPER-FILMS
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[33] OXIDATION-INDUCED CHANGES IN THE ELECTRO-OPTICAL PROPERTIES OF THIN COPPER-FILMS
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[37] THE INTERACTION OF ATOMIC OXYGEN WITH THIN COPPER-FILMS
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[38] POINT CONTACT SPECTROSCOPY OF THIN COPPER-FILMS
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[39] KINETICS OF THE INTERACTION OF THE TITANIUM TETRACHLORIDE WITH COPPER-FILMS
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[40] STRAIN COEFFICIENT OF RESISTANCE OF THIN COPPER-FILMS
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