HEAT OF ANNEALING IN SIMPLE ALKALI SILICATE GLASSES

被引：13

作者：

TISCHER, RE

机构：

来源：

JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1969年 / 52卷 / 09期

关键词：

D O I：

10.1111/j.1151-2916.1969.tb09202.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：499 / &

共 50 条

[41] IONIC CONDUCTION IN ALKALI AND THALLIUM SILICATE GLASSES
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[42] TRANSPORT MECHANISMS IN ALKALI SILICATE-GLASSES
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[43] Electrical conductivity of some alkali silicate glasses
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[48] STRUCTURE OF SIMPLE SILICATE AND BORATE GLASSES
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[49] How relevant is the network dynamics for the alkali diffusion in alkali silicate glasses?
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[50] SECONDARY ELECTRICAL RELAXATIONS IN ALKALI SILICATE-GLASSES
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