OPTICAL-EMISSION SPECTROSCOPY OF PLASMA PROCESSES IN THE DEPOSITION OF AMORPHOUS SILICON ALLOYS

被引：0

作者：

GRIFFITH, RW ^{[1
]}

KAMPAS, FJ ^{[1
]}

VANIER, PE ^{[1
]}

机构：

[1] BROOKHAVEN NATL LAB,DIV MET & MAT SCI,UPTON,NY 11973

来源：

JOURNAL OF ELECTRONIC MATERIALS | 1979年 / 8卷 / 05期

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：728 / 728

页数：1

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