VACUUM-DEPOSITED THIN-FILM CAPACITORS OF SILICON MONOXIDE

被引：9

|

作者：

VANSTEEN.K

机构：

来源：

MICROELECTRONICS RELIABILITY | 1967年 / 6卷 / 04期

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D O I：

10.1016/0026-2714(67)90081-9

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

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页码：261 / &

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