Experimental and Finite Element Study of Tribological Characteristics of SU-8 Thin Film

被引:0
|
作者
Yang, Woo Yul [1 ]
Shin, Myounggeun [1 ]
Kim, Hyung Man [1 ]
Han, Sangchul [1 ]
Sung, In-Ha [1 ]
机构
[1] Hannam Univ, Dept Mech Engn, Daejeon, South Korea
关键词
SU-8 Photoresist (SU-8); Friction; Adhesion; Finite Element Analysis; Atomic Force Microscope; Critical Load;
D O I
10.3795/KSME-A.2013.37.4.467
中图分类号
TH [机械、仪表工业];
学科分类号
0802 ;
摘要
In this study, two-dimensional finite element models were developed and experiments were conducted using an atomic force microscope to investigate the tribological characteristics of an SU-8 layer coated on a patterned wafer for microsystem applications. The results revealed that both the adhesion and the friction forces measured by the atomic force microscope were lower for the SU-8 coated surface than for the bare silicon surface. This is attributed to the hydrophobicity of SU-8. Another important result derived from the finite element analysis was the critical load required to fracture the SU-8 film with respect to the thickness. The critical loads for thicknesses of 200, 400, and 800 nm were approximately 13, 22, and 28 mN, respectively, which corresponded to a Hertzian contact pressure of 1.2-1.8 GPa. These results will aid in the design of a suitable SU-8 thickness for microsystem components that are in contact with one another.
引用
收藏
页码:467 / 473
页数:7
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