HIGH-RATE SPUTTERING TECHNIQUES

被引:62
|
作者
THORNTON, JA
机构
关键词
Compendex;
D O I
10.1016/0040-6090(81)90201-7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
PROTECTIVE COATINGS
引用
收藏
页码:1 / 11
页数:11
相关论文
共 50 条
  • [21] HIGH-RATE SPUTTERING OF ALUMINUM FOR METALLIZATION OF INTEGRATED-CIRCUITS
    MCLEOD, PS
    HARTSOUGH, LD
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01): : 263 - 265
  • [22] REACTIVE HIGH-RATE SPUTTERING BY THE DC-MAGNETRON TECHNIQUE
    STEENBECK, K
    STEINBEISS, E
    VAKUUM-TECHNIK, 1989, 38 (08): : 244 - 253
  • [23] High-rate sputtering of thick PZT thin films for MEMS
    Harald Jacobsen
    Klaus Prume
    Bernhard Wagner
    Kai Ortner
    Thomas Jung
    Journal of Electroceramics, 2010, 25 : 198 - 202
  • [24] HIGH-RATE REACTIVE SPUTTERING ONTO FLEXIBLE POLYMER SHEET
    HOWSON, RP
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1988, 135 (08) : C356 - C356
  • [25] High-rate reactive dc magnetron sputtering of ZrOx coatings
    Wong, MS
    Chia, WJ
    Yashar, P
    Schneider, JM
    Sproul, WD
    Barnett, SA
    SURFACE & COATINGS TECHNOLOGY, 1996, 86 (1-3): : 381 - 387
  • [26] HIGH-RATE SPUTTERING TECHNOLOGY AND ITS APPLICATION IN VARIOUS FIELDS
    SCHILLER, S
    HEISIG, U
    GOEDICKE, K
    VAKUUM-TECHNIK, 1988, 37 (06): : 162 - 175
  • [27] METALLIZATION OF SEMICONDUCTOR-DEVICES BY HIGH-RATE SPUTTERING OF ALUMINUM
    HUBNER, D
    MEISTER, W
    REISSMULLER, L
    SCHILLER, S
    HEISIG, U
    THIN SOLID FILMS, 1978, 54 (03) : 345 - 351
  • [28] COPPER-BASE MATERIALS FORMED BY HIGH-RATE SPUTTERING
    BUSCH, R
    MCCLANAHAN, ED
    THIN SOLID FILMS, 1977, 45 (02) : 386 - 386
  • [29] High-rate sputtering of thick PZT layers for mems actuators
    Jacobsen, H
    Quenzer, HJ
    Wagner, B
    Ortner, K
    Jung, T
    MEMS 2006: 19TH IEEE INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS, TECHNICAL DIGEST, 2006, : 214 - 217
  • [30] VERY HIGH-RATE REACTIVE SPUTTERING OF TIN, ZRN AND HFN
    SPROUL, WD
    THIN SOLID FILMS, 1983, 107 (02) : 141 - 147