SCANNING ELECTRON-DIFFRACTION STUDY OF VAPOR-DEPOSITED AND ION-IMPLANTED THIN-FILMS OF GE (I)

被引：56
|
作者：
GRACZYK, JF [1 ]
CHAUDHARI, P [1 ]
机构：
[1] IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY USA
来源：
PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS | 1973年 / 58卷 / 01期
关键词：
D O I：
10.1002/pssb.2220580116
中图分类号：
O469 [凝聚态物理学];
学科分类号：
070205 ;
摘要：
引用
收藏
页码：163 / 179
页数：17
相关论文
共 50 条
  • [41] XPS AND RAMAN CHARACTERIZATION OF ION-IMPLANTED POLYPARAPHENYLENE THIN-FILMS
    NGUYEN, TP
    LEFRANT, S
    FROYER, G
    PELOUS, Y
    RATIER, B
    MOLITON, A
    SYNTHETIC METALS, 1991, 41 (1-2) : 291 - 294
  • [42] THE GROWTH OF CRYSTALLINE VAPOR-DEPOSITED CARBON-60 THIN-FILMS
    KRAKOW, W
    RIVERA, NM
    ROY, RA
    RUOFF, RS
    CUOMO, JJ
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1993, 56 (03): : 185 - 192
  • [43] SCALING OF THE DROPLET-SIZE DISTRIBUTION IN VAPOR-DEPOSITED THIN-FILMS
    FAMILY, F
    MEAKIN, P
    PHYSICAL REVIEW LETTERS, 1988, 61 (04) : 428 - 431
  • [44] SPECTRAL RESPONSE CHARACTERISTICS OF ION-IMPLANTED CDS THIN-FILMS
    BHAR, TN
    LINDER, JS
    INDIAN JOURNAL OF PURE & APPLIED PHYSICS, 1977, 15 (09) : 663 - 665
  • [45] PLASMA ASSISTED CHEMICAL VAPOR-DEPOSITED THIN-FILMS FOR MICROELECTRONIC APPLICATIONS
    NGUYEN, SV
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (05): : 1159 - 1167
  • [46] STRUCTURE OF ORIENTED VAPOR-DEPOSITED GAAS FILMS STUDIED BY ELECTRON DIFFRACTION
    MULLER, EK
    JOURNAL OF APPLIED PHYSICS, 1964, 35 (3P1) : 580 - &
  • [47] ELECTRON-DIFFRACTION PATTERNS OF GD-FE THIN-FILMS DEPOSITED AT LOW-TEMPERATURE
    TSUKAHARA, S
    TSUSHIMA, T
    SCIENCE REPORTS OF THE RESEARCH INSTITUTES TOHOKU UNIVERSITY SERIES A-PHYSICS CHEMISTRY AND METALLURGY, 1980, 28 : 46 - 55
  • [48] ELECTRON-DIFFRACTION STUDY OF INSITU OXIDATION OF THIN-FILMS OF IRON, NICKEL AND COBALT
    BONNAFOUS, C
    BUTTO, C
    CALSOU, R
    DUBOURG, A
    PELLICER, A
    ANALUSIS, 1976, 4 (02) : 79 - 86
  • [49] ELECTRON-DIFFRACTION STUDY ON THIN-FILMS AROUND AU3MN
    YAMAMOTO, K
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1980, 59 (02): : 767 - 777
  • [50] RADIATION-DAMAGE AND ELECTRICAL-PROPERTIES OF ION-IMPLANTED CHEMICALLY VAPOR-DEPOSITED DIAMOND
    MORI, Y
    DEGUCHI, M
    EIMORI, N
    MA, JS
    HATTA, A
    NISHIMURA, K
    KITABATAKE, M
    ITO, T
    HIRAO, T
    HIRAKI, A
    DIAMOND AND RELATED MATERIALS, 1993, 2 (5-7) : 634 - 639
12345