SCANNING ELECTRON-DIFFRACTION STUDY OF VAPOR-DEPOSITED AND ION-IMPLANTED THIN-FILMS OF GE (I)

被引：56
|
作者：
GRACZYK, JF [1 ]
CHAUDHARI, P [1 ]
机构：
[1] IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY USA
来源：
PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS | 1973年 / 58卷 / 01期
关键词：
D O I：
10.1002/pssb.2220580116
中图分类号：
O469 [凝聚态物理学];
学科分类号：
070205 ;
摘要：
引用
收藏
页码：163 / 179
页数：17
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