PULSED ION SOURCES FOR SURFACE MODIFICATION OF MATERIALS

被引：11
|
作者：
KORENEV, S
机构：
[1] Joint Institute for Nuclear Research, Dubna
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1993年 / 80-1卷 / pt 2期
关键词：
D O I：
10.1016/0168-583X(93)96115-S
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
A series of pulsed ion sources, working on the basis of explosive ion emission, used for surface modification of different materials is described in this report. The ion sources consist of a vacuum diode and a high-voltage pulse generator. The pulse duration of the ion current t(p) is 0.1-10.0 mus and the kinetic energies of the ions from conducting materials (C, Cu, Nb, Ti, Mo and others) are between 2 and 600 keV. Emission characteristics of these ion sources are discussed.
引用
收藏
页码：242 / 245
页数：4
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