ELECTRONIC EFFECT ON SOLUBILITY OF INTERSTITIALS IN TRANSITION METAL ALLOYS

被引：5
|
作者：
CHAO, KA
ANSELL, GS
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1970年 / 41卷 / 01期
关键词：
D O I：
10.1063/1.1658358
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：417 / &
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