PRACTICAL PROPERTIES OF CHEMICAL VAPOR-DEPOSITION DIAMOND TOOLS

被引:18
|
作者
YASHIKI, T
NAKAMURA, T
FUJIMORI, N
NAKAI, T
机构
[1] Super Hard Material Department, Sumitomo Electric Industries, Ltd., Itami, Hyogo, 664, 1-1-1, Koya-Kita
来源
SURFACE & COATINGS TECHNOLOGY | 1992年 / 52卷 / 01期
关键词
D O I
10.1016/0257-8972(92)90373-I
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Cutting tools using chemical vapour deposition (CVD) diamond as the cutting surface and tape-automated-bonding (TAB) tools using CVD diamond as the bonding surface have been produced and their practical properties evaluated. CVD diamond end mills showed about 10 times longer tool life than cemented carbide end mills. CVD diamond inserts exhibited a cutting performance and tool life very similar to those of polycrystalline diamond inserts. CVD diamond TAB tools could be considered to be the most useful and cost-effective TAB tools among today's commercialized TAB tools.
引用
收藏
页码:81 / 85
页数:5
相关论文
共 50 条
  • [31] LASER SPECTROSCOPIC DIAGNOSTICS FOR CHEMICAL VAPOR-DEPOSITION OF DIAMOND FILMS
    SHAW, RW
    WHITTEN, WB
    RAMSEY, JM
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1991, 202 : 151 - PHYS
  • [32] EFFECT OF OXYGEN ON FILAMENT ACTIVITY IN DIAMOND CHEMICAL VAPOR-DEPOSITION
    SOMMER, M
    SMITH, FW
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1991, 9 (03): : 1134 - 1139
  • [33] SYNTHESIS OF DIAMOND BY LASER-INDUCED CHEMICAL VAPOR-DEPOSITION
    KITAHAMA, K
    HIRATA, K
    NAKAMATSU, H
    KAWAI, S
    FUJIMORI, N
    IMAI, T
    YOSHINO, H
    DOI, A
    APPLIED PHYSICS LETTERS, 1986, 49 (11) : 634 - 635
  • [34] NUCLEATION OF DIAMOND DURING HOT FILAMENT CHEMICAL VAPOR-DEPOSITION
    SINGH, J
    VELLAIKAL, M
    JOURNAL OF APPLIED PHYSICS, 1993, 73 (06) : 2831 - 2834
  • [35] SYNTHESIS OF A DIAMOND AND METAL MIXTURE BY THE CHEMICAL VAPOR-DEPOSITION PROCESS
    KAWARADA, M
    KURIHARA, K
    SASAKI, K
    JOURNAL OF APPLIED PHYSICS, 1992, 71 (03) : 1442 - 1445
  • [36] TRIBOLOGICAL PROPERTIES OF DIAMOND FILMS GROWN BY PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION
    WONG, MS
    MEILUNAS, R
    ONG, TP
    CHANG, RPH
    APPLIED PHYSICS LETTERS, 1989, 54 (20) : 2006 - 2008
  • [37] OBSERVATIONS OF THE NATURE OF DIAMOND FILM GROWN BY CHEMICAL VAPOR-DEPOSITION
    WALMSLEY, JC
    MICROSCOPY OF SEMICONDUCTING MATERIALS 1989, 1989, 100 : 265 - 270
  • [38] CHEMICAL VAPOR-DEPOSITION
    HIROSE, M
    SEMICONDUCTORS AND SEMIMETALS, 1984, 21 : 109 - 122
  • [39] CHEMICAL VAPOR-DEPOSITION
    JENSEN, KF
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1986, 192 : 5 - IAEC
  • [40] CHEMICAL VAPOR-DEPOSITION
    JENSEN, KF
    ADVANCES IN CHEMISTRY SERIES, 1989, (221): : 199 - 263