AXIAL AND LINEAR THERMAL-EXPANSION OF ZRO2 AND HFO2

被引:0
|
作者
RUH, R
HOLLENBERG, GW
SKAGGS, SR
STODDARD, SD
GAC, FD
CHARLES, EG
机构
[1] WESTINGHOUSE HANFORD CO,RICHLAND,WA 99352
[2] UNIV CALIF LOS ALAMOS SCI LAB,LOS ALAMOS,NM 87544
[3] UNIV CINCINNATI,CINCINNATI,OH 45221
来源
AMERICAN CERAMIC SOCIETY BULLETIN | 1981年 / 60卷 / 04期
关键词
D O I
暂无
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:504 / 506
页数:3
相关论文
共 50 条
  • [31] Stability and microbial toxicity of HfO2 and ZrO2 nanoparticles for photolithography
    Gonzalez-Estrella, Jorge
    Field, Jim A.
    Ober, Christopher K.
    Sierra-Alvarez, Reyes
    GREEN MATERIALS, 2019, 7 (03) : 109 - 117
  • [32] Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
    Bothe, Kyle M.
    von Hauff, Peter A.
    Afshar, Amir
    Foroughi-Abari, Ali
    Cadien, Kenneth C.
    Barlage, Douglas W.
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2013, 60 (12) : 4119 - 4124
  • [33] EPR characterization of defects in monoclinic powders of ZrO2 and HfO2
    Wright, Sandra
    Barklie, R. C.
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2006, 9 (06) : 892 - 896
  • [34] CRYSTAL STRUCTURE OF MONOCLINIC HFO2 AND A COMPARISON WITH MONOCLINIC ZRO2
    RUH, R
    CORFIELD, PW
    AMERICAN CERAMIC SOCIETY BULLETIN, 1969, 48 (04): : 401 - &
  • [35] Accelerated ferroelectric phase transformation in HfO2/ZrO2 nanolaminates
    Migita, Shinji
    Ota, Hiroyuki
    Asanuma, Shutaro
    Morita, Yukinori
    Toriumi, Akira
    APPLIED PHYSICS EXPRESS, 2021, 14 (05)
  • [36] NEW HIGH-PRESSURE PHASES OF ZRO2 AND HFO2
    LIU, LG
    JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1980, 41 (04) : 331 - 334
  • [37] Nanoparticle Photoresists from HfO2 and ZrO2 for EUV Patterning
    Trikeriotis, Markos
    Krysak, Marie
    Chung, Yeon Sook
    Ouyang, Christine
    Cardineau, Brian
    Brainard, Robert
    Ober, Christopher K.
    Giannelis, Emmanuel P.
    Cho, Kyoungyong
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2012, 25 (05) : 583 - 586
  • [38] Interfacial defect states in HfO2 and ZrO2 nMOS capacitors
    Mudanai, S
    Li, F
    Samavedam, SB
    Tobin, PJ
    Kang, CS
    Nieh, R
    Lee, JC
    Register, LF
    Banerjee, SK
    IEEE ELECTRON DEVICE LETTERS, 2002, 23 (12) : 728 - 730
  • [39] Atomic and electronic structures of amorphous ZrO2 and HfO2 films
    Gritsenko, V
    Gritsenko, D
    Shaimeev, S
    Aliev, V
    Nasyrov, K
    Erenburg, S
    Tapilin, V
    Wong, H
    Poon, MC
    Lee, JH
    Lee, JW
    Kim, CW
    MICROELECTRONIC ENGINEERING, 2005, 81 (2-4) : 524 - 529
  • [40] Properties of small TiO2, ZrO2 and HfO2 nanoparticles
    Woodley, S. M.
    Hamad, S.
    Mejias, J. A.
    Catlow, C. R. A.
    JOURNAL OF MATERIALS CHEMISTRY, 2006, 16 (20) : 1927 - 1933