CHEMICAL VAPOR-DEPOSITION OF VANADIUM-OXIDE THIN-FILMS

被引：5

|

作者：

SIEFERING, KL

GRIFFIN, GL

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1989年 / 136卷 / 03期

关键词：

D O I：

10.1149/1.2096771

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

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页码：897 / 898

页数：2

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