2ND APMP RESISTANCE INTERCOMPARISON

被引：1
|
作者：
JONES, K
GABRIEL, WP
机构：
[1] New Zealand Institute for Industrial Research, Lower Hutt
来源：
IEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENT | 1995年 / 44卷 / 02期
关键词：
D O I：
10.1109/19.377808
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
The results of a recent resistance intercomparison carried out as part of the Asia Pacific Metrology Program (APMP) show good agreement within the quoted uncertainties. Three 1 Omega and one 10 k Omega standards were used. A travel-induced change in one 1-Omega resistor is clearly recorded. Eight national standards laboratories participated, including some laboratories with quantum Hall resistance standards.
引用
收藏
页码：196 / 198
页数：3
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