PHOTOEMISSION-STUDY OF CE/NI(110) SYSTEM

被引:3
|
作者
OKANE, T
YAMADA, M
SUZUKI, S
SATO, S
KINOSHITA, T
KAKIZAKI, A
ISHII, T
YUHARA, J
KATOH, M
MORITA, K
机构
[1] UNIV TOKYO, INST SOLID STATE PHYS, SYNCHROTRON RADIAT LAB, TOKYO 106, JAPAN
[2] NAGOYA UNIV, SCH ENGN, DEPT CRYSTALLINE MAT SCI, NAGOYA, AICHI 46401, JAPAN
关键词
CE/NI(110); INTERFACE LAYERS; DIFFUSION; XPS; UPS; RESONANT PHOTOEMISSION;
D O I
10.1143/JPSJ.64.1673
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We have studied the electronic structures of Ce/Ni(110) system by the 4d-4f resonant photoemission using synchrotron radiation and the Ce3d core level X-ray photoemission. The results are interpreted in conjunction with the inter-diffusion of Ce and Ni atoms through the interface. The annealing after the deposition of Ce causes active diffusion of Ce atoms into the Ni substrate and Ni atoms into the Ce layers and brings about a well-ordered surface. Both the Ce3d core level and valence band spectra show remarkable changes depending on the degree of inter-diffusion between Ce and Ni at the interface. It is revealed that a close relation exists between the Ce concentration and strength of the 4f-conduction states hybridization in the surface layer. The importance of the Ce4f-Ni3d hybridization is emphasized.
引用
收藏
页码:1673 / 1682
页数:10
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