VORTEX FLOW CHARACTERISTICS OF HIGH-T-C, FLUX-FLOW TRANSISTORS

被引：25
|
作者：
MIYAHARA, K
KUBO, S
SUZUKI, M
机构：
[1] NTT Interdisciplinary Research Laboratories, Ibaraki 319-11
来源：
JOURNAL OF APPLIED PHYSICS | 1994年 / 75卷 / 01期
关键词：
D O I：
10.1063/1.355865
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
High-T-c superconducting flux flow transistors were fabricated from thin films of coevaporated YBaCuO. The vortex flow characteristics of the devices were experimentally investigated. The flow velocity of a vortex along a channel was measured from the applied magnetic field dependence of the I-V characteristics. It is 3.6-6.9X10(5) m/s when the bias current is 3-6 mA. This value is of the same order as that of a Josephson vortex flowing along a barrier region in a super-normal-super junction, and more than three orders of magnitude larger than that in type-II metal superconducting thin films.
引用
收藏
页码：404 / 407
页数：4
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